Invention Grant
- Patent Title: Apparatus for forming porous silicon layers on at least two surfaces of a plurality of silicon templates
- Patent Title (中): 用于在多个硅模板的至少两个表面上形成多孔硅层的装置
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Application No.: US13554103Application Date: 2012-07-20
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Publication No.: US09401276B2Publication Date: 2016-07-26
- Inventor: Mehrdad M. Moslehi , Karl-Josef Kramer , David Xuan-Qi Wang , Pawan Kapur , Somnath Nag , George D. Kamian , Jay Ashjaee , Takao Yonehara
- Applicant: Mehrdad M. Moslehi , Karl-Josef Kramer , David Xuan-Qi Wang , Pawan Kapur , Somnath Nag , George D. Kamian , Jay Ashjaee , Takao Yonehara
- Applicant Address: US CA Milpitas
- Assignee: Solexel, Inc.
- Current Assignee: Solexel, Inc.
- Current Assignee Address: US CA Milpitas
- Agent John Wood
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L31/18
Abstract:
An apparatus for forming porous silicon layers on at least two surfaces of a plurality of silicon templates in a batch electrochemical anodic etch process is provided. The apparatus comprises a plurality of edge-sealing template mounts operable to prevent formation of porous silicon at the edges of a plurality of templates. An electrolyte is disposed among the plurality of templates. The apparatus further comprises a power supply operable to switch polarity, change current intensity, and control etching time to produce the porous silicon layers.
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