Invention Grant
- Patent Title: Apparatus and methods for improving the intensity profile of a beam image used to process a substrate
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Application No.: US14253570Application Date: 2014-04-15
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Publication No.: US09401278B2Publication Date: 2016-07-26
- Inventor: Andrew M Hawryluk , Boris Grek , David A Markle
- Applicant: Ultratech, Inc.
- Applicant Address: US CA San Jose
- Assignee: Ultratech, Inc.
- Current Assignee: Ultratech, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Peters Verny, LLP
- Agent Allston L. Jones
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/263 ; H01L21/67
Abstract:
Methods and apparatuses are provided for improving the intensity profile of a beam image used to process a semiconductor substrate. At least one photonic beam may be generated and manipulated to form an image having an intensity profile with an extended uniform region useful for thermally processing the surface of the substrate. The image may be scanned across the surface to heat at least a portion of the substrate surface to achieve a desired temperature within a predetermined dwell time. Such processing may achieve a high efficiency due to the large proportion of energy contained in the uniform portion of the beam.
Public/Granted literature
- US20140227890A1 Apparatus and methods for improving the intensity profile of a beam image used to process a substrate Public/Granted day:2014-08-14
Information query
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