Invention Grant
- Patent Title: Radiation system and lithographic apparatus
- Patent Title (中): 辐射系统和光刻设备
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Application No.: US13062872Application Date: 2009-04-30
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Publication No.: US09411250B2Publication Date: 2016-08-09
- Inventor: Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
- Applicant: Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2009/003135 WO 20090430
- International Announcement: WO2010/028704 WO 20100318
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H05G2/00
Abstract:
A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.
Public/Granted literature
- US20110170079A1 RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS Public/Granted day:2011-07-14
Information query
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