Invention Grant
- Patent Title: Robot blade design
- Patent Title (中): 机器人叶片设计
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Application No.: US13959851Application Date: 2013-08-06
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Publication No.: US09434076B2Publication Date: 2016-09-06
- Inventor: Lee-Chuan Tseng , Chih-Jen Chan , Shih-Wei Lin , Che-Ming Chang , Chung-Yen Chou , Yuan-Chih Hsieh
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Associates, LLC
- Main IPC: B25J11/00
- IPC: B25J11/00 ; B25J15/00 ; H01L21/677 ; H01L21/687

Abstract:
The present disclosure relates to a wafer transfer robot having a robot blade that can be used to handle substrates that are patterned on both sides without causing warpage of the substrates. In some embodiments, the wafer transfer robot has a robot blade coupled to a transfer arm that varies a position of the robot blade. The robot blade has a wafer reception area that receives a substrate. Two or more spatially distinct contact points are located at positions along a perimeter of the wafer reception area that provide support to opposing edges of the substrate. The two or more contact points are separated by a cavity in the robot blade. The cavity mitigates contact between a backside of the substrate and the robot blade, while providing support to opposing sides of the substrate to prevent warpage of the substrate.
Public/Granted literature
- US20150044008A1 Robot Blade Design Public/Granted day:2015-02-12
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