Invention Grant
- Patent Title: Water soluble mask formation by dry film vacuum lamination for laser and plasma dicing
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Application No.: US14590910Application Date: 2015-01-06
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Publication No.: US09443765B2Publication Date: 2016-09-13
- Inventor: Wei-Sheng Lei , James S. Papanu , Prabhat Kumar , Brad Eaton , Ajay Kumar
- Applicant: Wei-Sheng Lei , James S. Papanu , Prabhat Kumar , Brad Eaton , Ajay Kumar
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely Sokoloff Taylor Zafman LLP
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L21/82 ; H01L21/67 ; H01L21/306 ; H01L21/56 ; H01L21/683 ; H01L23/00

Abstract:
Methods and systems for dicing a semiconductor wafer including a plurality of integrated circuits (ICs) are described. In one embodiment, a method involves adhering an adhesive tape to a thin water soluble dry film. The method involves applying the thin water soluble dry film adhered to the adhesive tape over a surface of the semiconductor wafer. The method involves removing the adhesive tape from the thin water soluble dry film. The thin water soluble dry film is patterned with a laser scribing process, exposing regions of the semiconductor wafer between the ICs. The method involves etching the semiconductor wafer through gaps in the patterned thin water soluble dry film, and removing the thin water soluble dry film.
Public/Granted literature
- US20150214111A1 WATER SOLUBLE MASK FORMATION BY DRY FILM VACUUM LAMINATION FOR LASER AND PLASMA DICING Public/Granted day:2015-07-30
Information query
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