Invention Grant
- Patent Title: Method of manufacturing gas barrier film, gas barrier film, and organic photoelectric conversion element
- Patent Title (中): 阻气膜,阻气膜和有机光电转换元件的制造方法
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Application No.: US13806817Application Date: 2011-06-23
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Publication No.: US09457376B2Publication Date: 2016-10-04
- Inventor: Takahiro Mori
- Applicant: Takahiro Mori
- Applicant Address: JP Tokyo
- Assignee: KONICA MINOLTA HOLDINGS, INC.
- Current Assignee: KONICA MINOLTA HOLDINGS, INC.
- Current Assignee Address: JP Tokyo
- Agency: Lucas & Mercanti, LLP
- Priority: JP2010-159464 20100714
- International Application: PCT/JP2011/064376 WO 20110623
- International Announcement: WO2012/008277 WO 20120119
- Main IPC: B05D3/06
- IPC: B05D3/06 ; B05D7/04 ; C23C18/12 ; C23C18/14 ; H01L51/44 ; H01L51/52

Abstract:
Disclosed is a method of manufacturing a gas barrier film possessing a substrate in the form of a belt and provided thereon, a gas barrier layer containing silicon oxide, possessing a coating step in which a coating solution comprising a polysilazane compound is coated on the substrate to form a coating film, and a UV radiation exposure step in which the coating film is exposed to the vacuum UV radiation emitted from the plural light sources facing the substrate while moving the substrate on which the coating film is formed relatively to the plural light sources, the plural light sources each exhibiting even illuminance along a width direction of the substrate to form a gas barrier layer, and provided is a method of manufacturing a gas barrier film by which the gas barrier film suitable for production coupled with roll-to-roll system, exhibiting excellent gas barrier performance can be prepared.
Public/Granted literature
- US20130092239A1 METHOD OF MANUFACTURING GAS BARRIER FILM, GAS BARRIER FILM, AND ORGANIC PHOTOELECTRIC CONVERSION ELEMENT Public/Granted day:2013-04-18
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