Invention Grant
- Patent Title: Detecting apparatus, wafer and electronic device
- Patent Title (中): 检测装置,晶片和电子装置
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Application No.: US13752410Application Date: 2013-01-29
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Publication No.: US09466540B2Publication Date: 2016-10-11
- Inventor: Takahiro Yamaguchi , Satoshi Komatsu , Kunihiro Asada , James Sumit Tandon
- Applicant: ADVANTEST CORPORATION , The University of Tokyo
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: ADVANTEST CORPORATION,THE UNIVERSITY OF TOKYO
- Current Assignee: ADVANTEST CORPORATION,THE UNIVERSITY OF TOKYO
- Current Assignee Address: JP Tokyo JP Tokyo
- Priority: JP2013-003604 20130111
- Main IPC: G01R35/00
- IPC: G01R35/00 ; H01L21/66 ; G01R31/28

Abstract:
Provided is a detection apparatus that detects process variation in a plurality of comparators that each output a comparison result obtained by comparing a signal level of an input signal to a reference level, the detection apparatus comprising a signal input section that inputs the input signal and the reference level in common to the comparators, and sequentially changes the signal level of the input signal; and a detecting section that detects, for each signal level, a number of comparison results that indicate a predetermined result, from among the comparison results of the comparators, and detects the process variation based on a distribution of the number of comparison results that indicate the predetermined result.
Public/Granted literature
- US20140197846A1 DETECTING APPARATUS, WAFER AND ELECTRONIC DEVICE Public/Granted day:2014-07-17
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