Invention Grant
- Patent Title: Barrier coating with reduced process time
- Patent Title (中): 阻隔涂层减少加工时间
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Application No.: US12577629Application Date: 2009-10-12
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Publication No.: US09472783B2Publication Date: 2016-10-18
- Inventor: Ahmet Gun Erlat , George Theodore Dalakos , Brian Joseph Scherer
- Applicant: Ahmet Gun Erlat , George Theodore Dalakos , Brian Joseph Scherer
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agency: Fletcher Yoder, P.C.
- Agent Jean K. Testa
- Main IPC: H05H1/24
- IPC: H05H1/24 ; H01L51/52 ; C23C16/00 ; B05D1/00

Abstract:
The present techniques provide systems and methods for protecting electronic devices such as organic light emitting devices (OLEDs) from adverse environmental effects using a thin film encapsulation with reduced process time. In some embodiments, the process time of forming a graded barrier over the OLED structure may take less than 5 minutes, and may result in substantially similar barrier properties as those of metal and epoxy sealants and/or typical thin film encapsulations. The process time of forming the barrier may be reduced by increasing deposition rates for organic and/or inorganic materials, reducing the thicknesses of organic and/or inorganic layers, and/or varying the number of zones in the barrier.
Public/Granted literature
- US20110086183A1 BARRIER COATING WITH REDUCED PROCESS TIME Public/Granted day:2011-04-14
Information query
IPC分类: