Invention Grant
- Patent Title: Forward flux channel X-ray source
- Patent Title (中): 正向磁通通道X射线源
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Application No.: US14214811Application Date: 2014-03-15
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Publication No.: US09508523B2Publication Date: 2016-11-29
- Inventor: Mark F Eaton , Mark Lucente
- Applicant: Mark F Eaton , Mark Lucente
- Applicant Address: US TX Austin
- Assignee: STELLARRAY, INC.
- Current Assignee: STELLARRAY, INC.
- Current Assignee Address: US TX Austin
- Main IPC: H01J35/08
- IPC: H01J35/08 ; G21K1/02

Abstract:
This invention provides a source of x-ray flux in which x-rays are produced by e-beams impacting the inner walls of holes or channels formed in a metal anode such that most of the electrons reaching the channel impact an upper portion of said channel. A portion of the electrons from this primary impact will generate x-rays. Most of the electrons scatter but they continue to ricochet down the channel, most of them generating x-rays, until the beam is spent. A single channel source of high power efficiency and high power level x-rays may be made in this way, or the source can be of an array of such channels, to produce parallel collimated flux beams of x-rays.
Public/Granted literature
- US20150262783A1 Forward Flux Channel X-ray Source Public/Granted day:2015-09-17
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