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    Forward flux channel X-ray source
    4.
    发明授权
    Forward flux channel X-ray source 有权
    正向磁通通道X射线源

    公开(公告)号：US09508523B2

    公开(公告)日：2016-11-29

    申请号：US14214811

    申请日：2014-03-15

    Applicant: Mark F Eaton ,  Mark Lucente

    Inventor： Mark F Eaton ,  Mark Lucente

    IPC: H01J35/08 ,  G21K1/02

    CPC classification number: H01J35/08 ,  G21K1/02 ,  H01J2235/086 ,  H01J2235/18

    Abstract: This invention provides a source of x-ray flux in which x-rays are produced by e-beams impacting the inner walls of holes or channels formed in a metal anode such that most of the electrons reaching the channel impact an upper portion of said channel. A portion of the electrons from this primary impact will generate x-rays. Most of the electrons scatter but they continue to ricochet down the channel, most of them generating x-rays, until the beam is spent. A single channel source of high power efficiency and high power level x-rays may be made in this way, or the source can be of an array of such channels, to produce parallel collimated flux beams of x-rays.

    Abstract translation: 本发明提供一种X射线通量的源，其中通过撞击在金属阳极中形成的孔或通道的内壁的电子束产生X射线，使得到达通道的大部分电子冲击所述通道的上部 。 来自该主要冲击的电子的一部分将产生x射线。 大多数电子散射，但是它们继续向下流动通道，大多数电子产生X射线，直到光束消耗。 可以以这种方式制造高功率效率和高功率级X射线的单通道源，或者源可以是这种通道的阵列，以产生平行准直的X射线束。

    Forward Flux Channel X-ray Source
    5.
    发明申请
    Forward Flux Channel X-ray Source 审中-公开
    前向通量X射线源

    公开(公告)号：US20150262783A1

    公开(公告)日：2015-09-17

    申请号：US14214811

    申请日：2014-03-15

    Applicant: Mark F. Eaton ,  Mark Lucente

    Inventor： Mark F. Eaton ,  Mark Lucente

    IPC: H01J35/14 ,  H01J35/08 ,  H01J35/18 ,  G01N23/04

    CPC classification number: H01J35/08 ,  G21K1/02 ,  H01J2235/086 ,  H01J2235/18

    Abstract: This invention provides a source of x-ray flux in which x-rays are produced by e-beams impacting the inner walls of holes or channels formed in a metal anode such that most of the electrons reaching the channel impact an upper portion of said channel. A portion of the electrons from this primary impact will generate x-rays. Most of the electrons scatter but they continue to ricochet down the channel, most of them generating x-rays, until the beam is spent. A single channel source of high power efficiency and high power level x-rays may be made in this way, or the source can be of an array of such channels, to produce parallel collimated flux beams of x-rays.

    Abstract translation: 本发明提供一种X射线通量的源，其中通过撞击在金属阳极中形成的孔或通道的内壁的电子束产生X射线，使得到达通道的大部分电子冲击所述通道的上部 。 来自该主要冲击的电子的一部分将产生x射线。 大多数电子散射，但是它们继续向下流动通道，大多数电子产生X射线，直到光束消耗。 可以以这种方式制造高功率效率和高功率级X射线的单通道源，或者源可以是这种通道的阵列，以产生平行准直的X射线束。

    Multi-cathode EUV and soft x-ray source
    6.
    发明授权
    Multi-cathode EUV and soft x-ray source 有权

    公开(公告)号：US10748734B2

    公开(公告)日：2020-08-18

    申请号：US15256692

    申请日：2016-09-05

    Applicant: Mark F Eaton ,  Robert J. Hollingsworth

    Inventor： Mark F Eaton ,  Robert J. Hollingsworth

    IPC: H01J35/06 ,  H01J35/08 ,  H01J29/08 ,  G03F7/20 ,  G21K1/06

    Abstract: An efficient source of EUV or SXR flux uses multiple e-beams from multiple cathodes to impact a wide anode target with a flux-generating surface to generate flux over a wide area. The conversion efficiency of e-beam power to flux power may be improved by the direction of the e-beams towards the anode target at shallow or grazing incidence angles or the use of mirrored anode surfaces which reflect EUV or SXR. The source is enclosed in a vacuum chamber and performs work such as the penetration of photoresist on a semiconductor wafer in vacuum.

    UV Pipe
    7.
    发明申请
    UV Pipe 有权
    紫外线管

    公开(公告)号：US20150262780A1

    公开(公告)日：2015-09-17

    申请号：US14209494

    申请日：2014-03-13

    Applicant: Mark F. Eaton

    Inventor： Mark F. Eaton

    IPC: H01J19/57 ,  H01J19/02

    CPC classification number: A61L2/10 ,  A61L9/205 ,  H01J63/02

    Abstract: A pipe source of UV flux has an inner pipe made of UV transmissive material and coated on its outer surface with a UV emitting phosphor. An outer pipe has a cathode array disposed on or near its inner surface, such as an array of thermionic filament cathodes mounted longitudinally or transverse to the length of the pipe, cold cathode arrays formed on the inner surface of the pipe or cold cathode arrays formed on separate substrates which are then attached to the inner surface of the outer pipe. The ends of this two-pipe assembly are hermetically sealed with flanges or end plates at either end of the pipe and evacuated to a pressure below 1×10−3 Torr. Internal spacing rings may be used to provide additional separation between the inner and out pipes. Current from the cathode arrays is accelerated by an anode voltage to strike the UV phosphors when then emit UV light flux which illuminates the inside of the pipe and the fluid material flowing through the inner pipe.

    Abstract translation: UV通量的管道源具有由UV透射材料制成的内管，并且在其外表面上涂覆有UV发射磷光体。 外管具有设置在其内表面上或附近的阴极阵列，例如纵向或横向于管的长度安装的热离子丝阴极的阵列，形成在管的内表面上的冷阴极阵列或形成的冷阴极阵列 在分开的基板上，然后将其附接到外管的内表面。 该双管组件的端部在管的任一端用法兰或端板密封，并排空到低于1×10-3乇的压力。 内部间隔环可用于在内管和外管之间提供额外的间隔。 当阴极阵列的电流通过阳极电压加速，以便当发出照射管内部和流过内管的流体材料的UV光通量时，冲击UV荧光体。

    Cathodoluminescent UV Panel
    8.
    发明申请
    Cathodoluminescent UV Panel 审中-公开
    阴极发光紫外线面板

    公开(公告)号：US20150262779A1

    公开(公告)日：2015-09-17

    申请号：US14208442

    申请日：2014-03-13

    Applicant: Stellarray, Inc.

    Inventor： Mark F. Eaton

    IPC: H01J19/57 ,  H01J19/32

    CPC classification number: H01J63/06

    Abstract: A flat panel UV source emits UV flux from one or more phosphor materials disposed on an anode plate and excited by electron beam current accelerated in vacuum toward the anode from one or more arrays of thermionic filament cathodes. The filament cathode arrays may be constructed and held in one or more cathode frames attached to or near a cathode plate. Increasing the number of these frames allows scaling of the areal size of the source, since the frames are constructed so as to allow for sag of the filaments as they are heated and cooled during operation.

    Abstract translation: 平板UV源从设置在阳极板上的一个或多个磷光体材料发射紫外线通量，并且由真空中的电子束电流从一个或多个热离子阴极阴极阵列向阳极激发。 灯丝阴极阵列可以被构造并保持在连接到阴极板或靠近阴极板的一个或多个阴极框架中。 增加这些框架的数量允许缩放源的面积尺寸，因为框架被构造成允许长丝在操作期间被加热和冷却时下垂。

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