Invention Grant
- Patent Title: Method for making light-emitting device
- Patent Title (中): 制造发光装置的方法
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Application No.: US14550016Application Date: 2014-11-21
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Publication No.: US09508891B2Publication Date: 2016-11-29
- Inventor: Chih-Chiang Lu , Yi-Chieh Lin , Wen-Luh Liao , Shou-Lung Chen , Chien-Fu Huang
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Ditthavong & Steiner, P.C.
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/08 ; H01L33/10

Abstract:
A method for making a light-emitting device comprises the steps of: providing a growth substrate; forming a first light-emitting semiconductor stack on the growth substrate by epitaxial growth, and the first light-emitting semiconductor stack comprises a first active layer; forming a Distributed Bragg reflector on the first light-emitting semiconductor stack by epitaxial growth; forming a second light-emitting semiconductor stack on the Distributed Bragg reflector by epitaxial growth, and the second light-emitting semiconductor stack comprises a second active layer; and wherein the first active layer emits a first radiation of a first dominant wavelength, and the second active layer emits a second radiation of a second dominant wavelength longer than the first dominant wavelength.
Public/Granted literature
- US20160149072A1 METHOD FOR MAKING LIGHT-EMITTING DEVICE Public/Granted day:2016-05-26
Information query
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