Invention Grant
- Patent Title: Pulsed ion beam source for electrospray mass spectrometry
- Patent Title (中): 用于电喷雾质谱的脉冲离子束源
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Application No.: US14450267Application Date: 2014-08-03
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Publication No.: US09524859B2Publication Date: 2016-12-20
- Inventor: Jung-Lee Lin , Chung-Hsuan Chen , Chen-Yu Hsieh
- Applicant: Academia Sinica
- Applicant Address: TW Taipei
- Assignee: Academic Sinica
- Current Assignee: Academic Sinica
- Current Assignee Address: TW Taipei
- Agency: Eckman Basu LLP
- Main IPC: H01J49/16
- IPC: H01J49/16 ; H01J49/04
Abstract:
Apparatus and methods for creating a pulsed ion beam. The pulsed ion beam can be used for performing mass spectrometry. A pulsed solenoid valve can provide a pulsed ion beam from an electrospray in a pre-vacuum chamber. The pulsed ion beam can enter a high vacuum region and a mass analyzer for mass spectrometry.
Public/Granted literature
- US20150136973A1 PULSED ION BEAM SOURCE FOR ELECTROSPRAY MASS SPECTROMETRY Public/Granted day:2015-05-21
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