Invention Grant
- Patent Title: Focusing a charged particle system
- Patent Title (中): 聚焦带电粒子系统
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Application No.: US14000213Application Date: 2012-02-17
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Publication No.: US09530613B2Publication Date: 2016-12-27
- Inventor: Steven R. Rogers , Rainer K. Knippelmeyer , Thomas Kemen , Stefan Schubert , Nissim Elmaliah
- Applicant: Steven R. Rogers , Rainer K. Knippelmeyer , Thomas Kemen , Stefan Schubert , Nissim Elmaliah
- Applicant Address: IL Rehovot DE Jena
- Assignee: Applied Materials Israel, Ltd.,Carl Zeiss Microscopy GmbH
- Current Assignee: Applied Materials Israel, Ltd.,Carl Zeiss Microscopy GmbH
- Current Assignee Address: IL Rehovot DE Jena
- Agency: Lowenstein Sandler LLP
- International Application: PCT/US2012/025656 WO 20120217
- International Announcement: WO2012/112894 WO 20120823
- Main IPC: G01N23/00
- IPC: G01N23/00 ; H01J37/21 ; H01J37/09 ; H01J37/153 ; H01J37/22 ; H01J37/28 ; H01J37/29 ; H01J37/26 ; H01J37/06 ; H01J37/244

Abstract:
A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.
Public/Granted literature
- US20150287568A1 FOCUSING A CHARGED PARTICLE SYSTEM Public/Granted day:2015-10-08
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