Invention Grant
- Patent Title: Imprint lithography
- Patent Title (中): 印刷光刻
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Application No.: US13579544Application Date: 2011-01-11
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Publication No.: US09535322B2Publication Date: 2017-01-03
- Inventor: Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
- Applicant: Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2011/050246 WO 20110111
- International Announcement: WO2011/107302 WO 20110909
- Main IPC: B29C59/02
- IPC: B29C59/02 ; G01B15/00 ; G03F7/00 ; B82Y10/00 ; B82Y40/00

Abstract:
A method of determining a position of an imprint template in an imprint lithography apparatus. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
Public/Granted literature
- US20120313295A1 IMPRINT LITHOGRAPHY Public/Granted day:2012-12-13
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