Invention Grant
- Patent Title: Support for a movable element and lithography apparatus
- Patent Title (中): 支持可移动元件和光刻设备
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Application No.: US14413667Application Date: 2013-05-15
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Publication No.: US09535340B2Publication Date: 2017-01-03
- Inventor: Fidelus Adrianus Boon , Sven Antoin Johan Hol , Olof Martinus Josephus Fischer
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/059999 WO 20130515
- International Announcement: WO2014/009042 WO 20140116
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20 ; F16C32/04

Abstract:
A support for a movable element includes a stator element, a gravity compensator field inducing element mounted on the stator element, the gravity compensator field inducing element configured to apply a translational force to the movable element by controlling a magnetic field in a gap between the stator element and the movable element, and a plurality of torque compensator field inducing elements mounted on the stator element, the torque compensator field inducing elements configured to apply a torque to the movable element by controlling a magnetic field in the gap between the stator element and the movable element, the torque being about a first axis substantially perpendicular to the direction of the translational force applied by the gravity compensator field inducing element.
Public/Granted literature
- US20150205210A1 SUPPORT FOR A MOVABLE ELEMENT AND LITHOGRAPHY APPARATUS Public/Granted day:2015-07-23
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