Invention Grant
- Patent Title: Faceted EUV optical element
- Patent Title (中): 方面的EUV光学元件
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Application No.: US14575699Application Date: 2014-12-18
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Publication No.: US09541840B2Publication Date: 2017-01-10
- Inventor: David C. Brandt , Alexander I. Ershov , Igor V. Fomenkov
- Applicant: CYMER, LLC
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Arent Fox LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B5/08 ; H05G2/00
Abstract:
A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets.
Public/Granted literature
- US20160179012A1 FACETED EUV OPTICAL ELEMENT Public/Granted day:2016-06-23
Information query
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