Invention Grant
US09550667B1 Semiconductor structure and manufacturing method thereof 有权
半导体结构及其制造方法

Semiconductor structure and manufacturing method thereof
Abstract:
A semiconductor structure includes a first substrate, a second substrate, a first sensing structure over the first substrate, and between the first substrate and the second substrate, a via extending through the second substrate, and a second sensing structure over the second substrate, and including an interconnect structure electrically connected with the via, and a sensing material at least partially covering the interconnect structure.
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