Invention Grant
- Patent Title: Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method
- Patent Title (中): 标记位置测量装置和方法,光刻设备和装置制造方法
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Application No.: US14428565Application Date: 2013-09-23
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Publication No.: US09551939B2Publication Date: 2017-01-24
- Inventor: Simon Gijsbert Josephus Mathijssen , Arie Jeffrey Den Boef , Stanley Drazkiewicz , Justin Lloyd Kreuzer , Gerrit Johannes Nijmeijer
- Applicant: ASML Netherlands B.V. , ASML Holding N.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/069664 WO 20130923
- International Announcement: WO2014/056708 WO 20140417
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03F7/20 ; G01B11/14

Abstract:
An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement including an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.
Public/Granted literature
- US20150234290A1 MARK POSITION MEASURING APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2015-08-20
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