Invention Grant
- Patent Title: Reverse-conducting semiconductor device
- Patent Title (中): 反向导电半导体器件
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Application No.: US15191295Application Date: 2016-06-23
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Publication No.: US09553086B2Publication Date: 2017-01-24
- Inventor: Liutauras Storasta , Chiara Corvasce , Manuel Le-Gallo , Munaf Rahimo
- Applicant: ABB Schweiz AG
- Applicant Address: CH
- Assignee: ABB SCHWEIZ AG
- Current Assignee: ABB SCHWEIZ AG
- Current Assignee Address: CH
- Agency: Taft Stettinius & Hollister LLP
- Priority: EP13199429 20131223; EP14163376 20140403
- Main IPC: H01L29/74
- IPC: H01L29/74 ; H01L27/06 ; H01L29/10 ; H01L29/08 ; H01L29/417 ; H01L29/06 ; H01L29/739

Abstract:
A Reverse-conducting semiconductor device which comprises a freewheeling diode and an insulated gate bipolar transistor on a common wafer, part of which wafer forms a base layer of a first conductivity type with a first doping concentration and a base layer thickness. The insulated gate bipolar transistor comprises a collector side and an emitter side opposite the collector side of the wafer. A cathode layer of a first conductivity type with at least one first region and a anode layer of a second conductivity type with at least one second and pilot region are alternately arranged on the collector side. Each region has a region area with a region width surrounded by a region border. The Reverse-conducting-IGBT of the present application satisfies a number of specific geometrical rules.
Public/Granted literature
- US20160307888A1 REVERSE-CONDUCTING SEMICONDUCTOR DEVICE Public/Granted day:2016-10-20
Information query
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