Invention Grant
- Patent Title: Stimulated emission depletion microscopy
- Patent Title (中): 受激发射耗尽显微镜
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Application No.: US14423188Application Date: 2013-08-16
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Publication No.: US09575302B2Publication Date: 2017-02-21
- Inventor: Martin Booth , Daniel Burke , Joerg Bewersdorf , Travis J. Gould
- Applicant: ISIS Innovation Limited
- Applicant Address: GB Oxfordshire
- Assignee: ISIS Innovation Ltd
- Current Assignee: ISIS Innovation Ltd
- Current Assignee Address: GB Oxfordshire
- Agency: Wood, Phillips, Katz, Clark & Mortimer
- Priority: GB1217171.6 20120926
- International Application: PCT/GB2013/052183 WO 20130816
- International Announcement: WO2014/029978 WO 20140227
- Main IPC: G01J1/58
- IPC: G01J1/58 ; G02B21/00 ; G02B26/06 ; G01N21/63 ; G01N21/64

Abstract:
Aberrations in stimulated emission depletion microscopy are corrected using an adaptive optics approach using a metric which combines both image sharpness and brightness. Light modulators (22,32) are used to perform aberration correction in one or more of the depletion path (10), the excitation path (12), or the emission path from sample to detector.
Public/Granted literature
- US20150226950A1 STIMULATED EMISSION DEPLETION MICROSCOPY Public/Granted day:2015-08-13
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