Invention Grant
US09588066B2 Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS)
有权
使用多角度X射线反射散射法(XRS)测量周期结构的方法和系统
- Patent Title: Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS)
- Patent Title (中): 使用多角度X射线反射散射法(XRS)测量周期结构的方法和系统
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Application No.: US14161942Application Date: 2014-01-23
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Publication No.: US09588066B2Publication Date: 2017-03-07
- Inventor: Heath A. Pois , David A. Reed , Bruno W. Schueler , Rodney Smedt , Jeffrey T. Fanton
- Applicant: Heath A. Pois , David A. Reed , Bruno W. Schueler , Rodney Smedt , Jeffrey T. Fanton
- Applicant Address: US CA Santa Clara
- Assignee: ReVera, Incorporated
- Current Assignee: ReVera, Incorporated
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely Sokoloff Taylor Zafman LLP
- Main IPC: G01N23/201
- IPC: G01N23/201 ; H01L21/66

Abstract:
Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) are disclosed. For example, a method of measuring a sample by X-ray reflectance scatterometry involves impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously providing a plurality of incident angles and a plurality of azimuthal angles. The method also involves collecting at least a portion of the scattered X-ray beam.
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