Invention Grant
- Patent Title: Apparatus for treating surfaces of wafer-shaped articles
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Application No.: US14145241Application Date: 2013-12-31
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Publication No.: US09597701B2Publication Date: 2017-03-21
- Inventor: Rainer Obweger , Andreas Gleissner , Philipp Engesser
- Applicant: LAM RESEARCH AG
- Applicant Address: AT Villach
- Assignee: LAM RESEARCH AG
- Current Assignee: LAM RESEARCH AG
- Current Assignee Address: AT Villach
- Main IPC: B05B13/02
- IPC: B05B13/02 ; H01L21/67 ; H01L21/687 ; C23C14/50 ; C30B25/14 ; C23C16/458 ; C30B25/12

Abstract:
An apparatus for processing wafer-shaped articles comprises a closed process chamber providing a gas-tight enclosure. A rotary chuck is located within the closed process chamber, and is adapted to hold a wafer shaped article thereon. A lid is secured to an upper part of the closed process chamber. The lid comprises an annular chamber, gas inlets communicating with the annular chamber and opening on a surface of the lid facing outwardly of the closed process chamber, and gas outlets communicating with the annular chamber and opening on a surface of the lid facing inwardly of the closed process chamber.
Public/Granted literature
- US20150187629A1 APPARATUS FOR TREATING SURFACES OF WAFER-SHAPED ARTICLES Public/Granted day:2015-07-02
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