Invention Grant
- Patent Title: Optoelectronic device and method for manufacturing the same
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Application No.: US14591772Application Date: 2015-01-07
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Publication No.: US09601655B2Publication Date: 2017-03-21
- Inventor: Jia-Kuen Wang , Chao-Hsing Chen
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Patterson + Sheridan, LLP
- Priority: TW103100593A 20140107
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/36 ; H01L33/38 ; H01L33/40 ; H01L33/44

Abstract:
An optoelectronic device comprises a semiconductor stack, wherein the semiconductor stack comprises a first semiconductor layer, an active layer formed on the first semiconductor layer, and a second semiconductor layer formed on the active layer; an electrode formed on the second semiconductor layer, wherein the first electrode further comprises a reflective layer; and an insulative layer formed on the second semiconductor layer, and a space formed between the first electrode and the insulative layer.
Public/Granted literature
- US20150194574A1 OPTOELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2015-07-09
Information query
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