Invention Grant
- Patent Title: Hybrid aspect ratio trapping
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Application No.: US14672311Application Date: 2015-03-30
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Publication No.: US09608067B2Publication Date: 2017-03-28
- Inventor: Kangguo Cheng , Ramachandra Divakaruni , Hong He , Juntao Li
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Steven J. Meyers
- Main IPC: H01L29/10
- IPC: H01L29/10 ; H01L29/78 ; H01L21/28 ; H01L29/161

Abstract:
A semiconductor structure includes a material stack located on a surface of a semiconductor substrate. The material stack includes, from bottom to top, a silicon germanium alloy portion that is substantially relaxed and defect-free and a semiconductor material pillar that is defect-free. A dielectric material structure surrounds sidewalls of the material stack and is present on exposed portions of the semiconductor substrate.
Public/Granted literature
- US20160293704A1 HYBRID ASPECT RATIO TRAPPING Public/Granted day:2016-10-06
Information query
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