Invention Grant
- Patent Title: Lithographic apparatus and a device manufacturing method involving an elongate liquid supply opening or an elongate region of relatively high pressure
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Application No.: US13017700Application Date: 2011-01-31
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Publication No.: US09618835B2Publication Date: 2017-04-11
- Inventor: Daniel Jozef Maria Direcks , Erik Henricus Egidius Catharina Eummelen , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Sergei Shulepov , Pieter Mulder , David Bessems , Marco Baragona
- Applicant: Daniel Jozef Maria Direcks , Erik Henricus Egidius Catharina Eummelen , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Sergei Shulepov , Pieter Mulder , David Bessems , Marco Baragona
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.
Public/Granted literature
- US20110188012A1 LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD Public/Granted day:2011-08-04
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