Invention Grant
- Patent Title: Method for manufacturing crystalline silicon-based solar cell and method for manufacturing crystalline silicon-based solar cell module
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Application No.: US14893716Application Date: 2014-04-01
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Publication No.: US09634176B2Publication Date: 2017-04-25
- Inventor: Daisuke Adachi , Masanori Kanematsu , Hisashi Uzu
- Applicant: KANEKA CORPORATION
- Applicant Address: JP Osaka-shi
- Assignee: KANEKA CORPORATION
- Current Assignee: KANEKA CORPORATION
- Current Assignee Address: JP Osaka-shi
- Agency: Alleman Hall McCoy Russell & Tuttle LLP
- Priority: JP2013-113526 20130529
- International Application: PCT/JP2014/059689 WO 20140401
- International Announcement: WO2014/192408 WO 20141204
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/0747 ; H01L31/0216 ; H01L31/0224 ; H01L31/0445 ; H01L31/048

Abstract:
A method for manufacturing a crystalline silicon-based solar cell having a photoelectric conversion section includes a silicon-based layer of an opposite conductivity-type on a first principal surface side of a crystalline silicon substrate of a first conductivity-type, and a collecting electrode formed by an electroplating method on a first principal surface of the photoelectric conversion section. By applying laser light from a first or second principal surface side of the photoelectric conversion section, an insulation-processed region his formed where a short-circuit between the first principal surface and a second principal surface of the photoelectric conversion section is eliminated. On the collecting electrode and/or the insulation-processed region, a protecting layer s formed for preventing diffusion of a metal contained in the collecting electrode into the substrate. After the protecting layer is formed, the insulation-processed region is heated to eliminate leakage between the substrate and the silicon-based layer.
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