Invention Grant
- Patent Title: Method for production of transparent conductive film
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Application No.: US14052453Application Date: 2013-10-11
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Publication No.: US09636877B2Publication Date: 2017-05-02
- Inventor: Motoki Haishi , Tomotake Nashiki , Tomonori Noguchi , Yoshifumi Asahara
- Applicant: NITTO DENKO CORPORATION
- Applicant Address: JP Ibaraki-shi
- Assignee: NITTO DENKO CORPORATION
- Current Assignee: NITTO DENKO CORPORATION
- Current Assignee Address: JP Ibaraki-shi
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2010-248842 20101105; JP2011-137003 20110621
- Main IPC: B05D3/02
- IPC: B05D3/02 ; B29C71/02 ; C23C14/08 ; C23C14/58 ; G06F3/044 ; G06F3/045

Abstract:
A method for producing a transparent conductive film includes heat-treating a transparent conductive film comprising a transparent film substrate and a transparent conductive laminate including a first transparent conductive layer and a second transparent conductive layer, so that the first and the second transparent conductive layers in the transparent conductive film are crystallized, wherein the first transparent conductive layer is a first amorphous layer comprising indium oxide or an indium-based complex oxide having a tetravalent metal element oxide, the second transparent conductive layer is a second amorphous layer comprising an indium-based complex oxide having a tetravalent metal element oxide, wherein each of the first and the second contents of the tetravalent metal element oxide content is expressed by the formula: {the amount of the tetravalent metal element oxide/(the amount of the tetravalent metal element oxide+the amount of indium oxide)}×100(%).
Public/Granted literature
- US20140035193A1 METHOD FOR PRODUCTION OF TRANSPARENT CONDUCTIVE FILM Public/Granted day:2014-02-06
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