Invention Grant
- Patent Title: Lithographic apparatus, programmable patterning device and lithographic method
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Application No.: US14006292Application Date: 2012-03-07
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Publication No.: US09645502B2Publication Date: 2017-05-09
- Inventor: Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Johannes Onvlee , Lucas Henricus Johannes Stevens , Sander Frederik Wuister , Nikolay Nikolaevich Iosad
- Applicant: Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Johannes Onvlee , Lucas Henricus Johannes Stevens , Sander Frederik Wuister , Nikolay Nikolaevich Iosad
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2012/053918 WO 20120307
- International Announcement: WO2012/136434 WO 20121011
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20 ; G02F1/29 ; G02F1/13
Abstract:
In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.
Public/Granted literature
- US20140071421A1 LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD Public/Granted day:2014-03-13
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