Invention Grant
- Patent Title: Method of controlling a radiation source and lithographic apparatus comprising the radiation source
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Application No.: US14787738Application Date: 2014-04-16
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Publication No.: US09645510B2Publication Date: 2017-05-09
- Inventor: Wilhelmus Patrick Elisabeth Maria Op 'T Root , Adrianus Leonardus Gertrudus Bommer , Robert De Jong , Frank Everts , Herman Philip Godfried , Roland Pieter Stolk , Paul Van Der Veen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2014/057709 WO 20140416
- International Announcement: WO2014/187619 WO 20141127
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20 ; H01S3/104 ; H01S3/0975 ; H01S3/225

Abstract:
A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.
Public/Granted literature
- US20160070179A1 METHOD OF CONTROLLING A RADIATION SOURCE AND LITHOGRAPHIC APPARATUS COMPRISING THE RADIATION SOURCE Public/Granted day:2016-03-10
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