Invention Grant
- Patent Title: Drop pattern generation for imprint lithography with directionally-patterned templates
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Application No.: US14329381Application Date: 2014-07-11
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Publication No.: US09651862B2Publication Date: 2017-05-16
- Inventor: Edward Brian Fletcher , Gerard M. Schmid , Se-Hyuk Im , Niyaz Khusnatdinov , Yeshwanth Srinivasan , Weijun Liu , Frank Y. Xu
- Applicant: Canon Nanotechnologies, Inc. , Toshiba Corporation
- Applicant Address: US TX Austin
- Assignee: Canon Nanotechnologies, Inc.
- Current Assignee: Canon Nanotechnologies, Inc.
- Current Assignee Address: US TX Austin
- Agent Cameron A. King
- Main IPC: G03F7/00
- IPC: G03F7/00 ; B29C43/02 ; B29C43/18 ; B29K105/00 ; B29L31/00 ; B05D3/06 ; B05D3/12
Abstract:
Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.
Public/Granted literature
- US20150017329A1 DROP PATTERN GENERATION FOR IMPRINT LITHOGRAPHY WITH DIRECTIONALLY-PATTERNED TEMPLATES Public/Granted day:2015-01-15
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