Invention Grant
- Patent Title: Apparatus for treating surfaces of wafer-shaped articles
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Application No.: US14144846Application Date: 2013-12-31
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Publication No.: US09657397B2Publication Date: 2017-05-23
- Inventor: Andreas Gleissner
- Applicant: LAM RESEARCH AG
- Applicant Address: AT Villach
- Assignee: LAM RESEARCH AG
- Current Assignee: LAM RESEARCH AG
- Current Assignee Address: AT Villach
- Main IPC: C23F1/08
- IPC: C23F1/08 ; H01J37/32 ; H01L21/67 ; H01L21/687

Abstract:
An apparatus for processing wafer-shaped articles comprises a closed process chamber providing a gas-tight enclosure. A rotary chuck is located within the closed process chamber, the rotary chuck being adapted to hold a wafer shaped article thereon. A lid is secured to an upper part of the closed process chamber, the lid comprising an upper plate formed from a composite fiber-reinforced material and a lower plate that faces into the process chamber and is formed from a chemically-resistant plastic.
Public/Granted literature
- US20150187624A1 APPARATUS FOR TREATING SURFACES OF WAFER-SHAPED ARTICLES Public/Granted day:2015-07-02
Information query
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