Invention Grant
- Patent Title: Charged particle beam apparatus and inspection method using the same
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Application No.: US14948167Application Date: 2015-11-20
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Publication No.: US09659744B2Publication Date: 2017-05-23
- Inventor: Natsuki Tsuno , Naomasa Suzuki , Hideyuki Kazumi , Shoji Hotta , Yoshinobu Kimura
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2014-235578 20141120
- Main IPC: H01J37/28
- IPC: H01J37/28 ; G01B15/04 ; H01J37/244 ; G01N23/00

Abstract:
A charged particle beam apparatus makes it possible to acquire information in the cross-sectional direction (depth direction) of a sample having an internal structure in a nondestructive manner with reduced damage. Further, the apparatus makes it possible to analyze the depth and/or dimensions in the depth direction of the internal structure. The charged particle beam apparatus includes: a means for providing a time base for control signals; a means for applying a charged particle beam to a sample in synchronization with the time base and controlling an irradiation position; a means for analyzing the emission characteristics of an emission electron from the sample from a detection signal of the emission electron; and a means for analyzing the electrical characteristics or cross-sectional morphological characteristics of the sample based on the emission characteristics.
Public/Granted literature
- US20160148781A1 CHARGED PARTICLE BEAM APPARATUS AND INSPECTION METHOD USING THE SAME Public/Granted day:2016-05-26
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