Invention Grant
- Patent Title: Methods for providing lithography features on a substrate by self-assembly of block copolymers
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Application No.: US14769426Application Date: 2014-02-26
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Publication No.: US09666443B2Publication Date: 2017-05-30
- Inventor: Sander Frederik Wuister , Emiel Peeters
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2014/053692 WO 20140226
- International Announcement: WO2014/139793 WO 20140918
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/3105 ; B81C1/00 ; H01L21/027 ; H01L21/033 ; G03F7/00 ; H01L21/768
Abstract:
Causing a self-assemblable block copolymer (BCP) having first and second blocks to migrate from a region surrounding a lithography recess of the substrate and a dummy recess on the substrate to within the lithography recess and the dummy recess, causing the BCP to self-assemble into an ordered layer within the lithography recess, the layer having a first block domain and a second block domain, and selectively removing the first domain to form a lithography feature having the second domain within the lithography recess, wherein a width of the dummy recess is smaller than the minimum width required by the BCP to self-assemble, the dummy recess is within the region of the substrate surrounding the lithography recess from which the BCP is caused to migrate, and the width between portions of a side-wall of the lithography recess is greater than the width between portions of a side-wall of the dummy recess.
Public/Granted literature
- US20150380266A1 METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS Public/Granted day:2015-12-31
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