Invention Grant
- Patent Title: Method of manufacturing a reverse blocking semiconductor device
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Application No.: US14986166Application Date: 2015-12-31
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Publication No.: US09679892B2Publication Date: 2017-06-13
- Inventor: Johannes Georg Laven , Roman Baburske , Christian Jaeger , Hans-Joachim Schulze
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L27/06 ; H01L21/04 ; H01L29/66 ; H01L29/06 ; H01L29/08

Abstract:
A reverse blocking semiconductor device is manufactured by introducing impurities of a first conductivity type into a semiconductor substrate of the first conductivity type through a process surface to obtain a process layer extending into the semiconductor substrate up to a first depth, and introducing impurities of a second, complementary conductivity type into the semiconductor substrate through openings of an impurity mask provided on the process surface to obtain emitter zones of the second conductivity type extending up to a second depth deeper than the first depth and channels of the first conductivity type between the emitter zones. Exposed portions of the process layer are removed above the emitter zones.
Public/Granted literature
- US20160118382A1 Method of Manufacturing a Reverse Blocking Semiconductor Device Public/Granted day:2016-04-28
Information query
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