- Patent Title: Method of controlling a lithographic apparatus, device manufacturing method, lithographic apparatus, computer program product and method of improving a mathematical model of a lithographic process
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Application No.: US13416387Application Date: 2012-03-09
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Publication No.: US09696635B2Publication Date: 2017-07-04
- Inventor: Adrianus Fransiscus Petrus Engelen , Henricus Johannes Lambertus Megens , Johannes Catharinus Hubertus Mulkens , Robert Kazinczi , Jen-Shiang Wang
- Applicant: Adrianus Fransiscus Petrus Engelen , Henricus Johannes Lambertus Megens , Johannes Catharinus Hubertus Mulkens , Robert Kazinczi , Jen-Shiang Wang
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20
Abstract:
A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of a test pattern having a plurality of features using a model of the lithographic apparatus and the measured value of the first parameter, and controlling the lithographic apparatus with reference to the calculated value of the second parameter.
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