Invention Grant
- Patent Title: Image processing device, charged particle beam device, charged particle beam device adjustment sample, and manufacturing method thereof
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Application No.: US13700096Application Date: 2011-05-25
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Publication No.: US09702695B2Publication Date: 2017-07-11
- Inventor: Hiroki Kawada , Osamu Inoue , Miyako Matsui , Takahiro Kawasaki , Naoshi Itabashi , Takashi Takahama , Katsumi Setoguchi , Osamu Komuro
- Applicant: Hiroki Kawada , Osamu Inoue , Miyako Matsui , Takahiro Kawasaki , Naoshi Itabashi , Takashi Takahama , Katsumi Setoguchi , Osamu Komuro
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2010-121122 20100527; JP2011-034975 20110221; JP2011-039181 20110225
- International Application: PCT/JP2011/061978 WO 20110525
- International Announcement: WO2011/148975 WO 20111201
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G01B15/00 ; H01J37/22 ; H01J37/28 ; G06K9/62

Abstract:
An object of the present invention is to provide an image processing apparatus that quickly and precisely measures or evaluates a distortion in a field of view and a charged particle beam apparatus. To attain the object, an image processing apparatus or the like is proposed which acquires a first image of a first area of an imaging target and a second image of a second area that is located at a different position than the first area and partially overlaps with the first area and determines the distance between a measurement point in the second image and a second part of the second image that corresponds to a particular area for a plurality of sites in the overlapping area of the first image and the second image.
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