Invention Grant
- Patent Title: Lithographic apparatus and a method of operating the apparatus
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Application No.: US14586390Application Date: 2014-12-30
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Publication No.: US09709901B2Publication Date: 2017-07-18
- Inventor: Ivo Adam Johannes Thomas , Siebe Landheer , Arnout Johannes Meester , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03F7/20
Abstract:
A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
Public/Granted literature
- US20150109592A1 LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS Public/Granted day:2015-04-23
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