Invention Grant
- Patent Title: Droplet generator, EUV radiation source, lithographic apparatus, method for generating droplets and device manufacturing method
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Application No.: US14443965Application Date: 2013-10-30
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Publication No.: US09715174B2Publication Date: 2017-07-25
- Inventor: Johan Frederik Dijksman , Ramin Badie , Ronald Johannes Hultermans , Dzmitry Labetski
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/072689 WO 20131030
- International Announcement: WO2014/082811 WO 20140605
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20 ; H05G2/00 ; B05B17/06

Abstract:
A droplet generator, for an EUV radiation source, comprises: a capillary in which, in use, molten material flows; an actuator configured to modulate a pressure inside the capillary; and a controller configured to drive the actuator at a driving frequency; wherein the droplet generator is arranged such that, in use, the driving frequency is equal or about equal to a main resonance frequency of the molten material in the capillary.
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