Invention Grant
- Patent Title: Resin composition and pattern forming method using the same
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Application No.: US14586129Application Date: 2014-12-30
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Publication No.: US09718901B2Publication Date: 2017-08-01
- Inventor: Takuya Tsuruta , Tomotaka Tsuchimura , Kaoru Iwato
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2012-167509 20120727
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/038 ; G03F7/20 ; C08F12/24 ; C08F12/32 ; C08F16/12 ; C08F16/26 ; C08F212/14 ; G03F7/004 ; C08F8/02

Abstract:
A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a halogen atom; R2 and R3 represent a hydrogen atom, an alkyl group, or a cycloalkyl group; L represents a divalent linking group or a single bond; Y represents a substituent excluding a methylol group; Z represents a hydrogen atom or a substituent; m represents an integer of 0 to 4; n represents an integer of 1 to 5; and m+n is 5 or less.
Public/Granted literature
- US20150118623A1 RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME Public/Granted day:2015-04-30
Information query
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