Invention Grant
- Patent Title: Electron microscope and sample observation method
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Application No.: US15322659Application Date: 2015-06-08
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Publication No.: US09754762B2Publication Date: 2017-09-05
- Inventor: Toshie Yaguchi , Hiroyuki Kobayashi , Takafumi Yotsuji
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Baker Botts L.L.P.
- Priority: JP2014-139273 20140707
- International Application: PCT/JP2015/066424 WO 20150608
- International Announcement: WO2016/006375 WO 20160114
- Main IPC: H01J37/22
- IPC: H01J37/22 ; H01J37/20 ; H01J37/244 ; H01J37/28

Abstract:
Provided are a device and a method allowing a crystal orientation to be adjusted with adequate throughput and high precision to observe a sample, regardless of the type of the sample or the crystal orientation. In the present invention, the method comprises: setting a fitting circular pattern (26) displayed overlaid so that a main spot (23) is positioned on the circumference thereof, on the basis of the diffraction spot brightness distribution in an electron diffraction pattern (22b) displayed on a display unit (13); setting a vector (28) displayed with the starting point at the center position (27) of the displayed circular pattern (26), and the end point at the location of the main spot (23) positioned on the circumference of the circular pattern (26); and adjusting the crystal orientation on the basis of the orientation and the magnitude of the displayed vector (28).
Public/Granted literature
- US20170133195A1 ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD Public/Granted day:2017-05-11
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