Invention Grant
- Patent Title: Electromagnetic radiation micro device, wafer element and method for manufacturing such a micro device
-
Application No.: US14384318Application Date: 2012-03-23
-
Publication No.: US09761740B2Publication Date: 2017-09-12
- Inventor: Wolfgang Reinert
- Applicant: Wolfgang Reinert
- Applicant Address: DE Munich
- Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
- Current Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
- Current Assignee Address: DE Munich
- Agency: Duane Morris LLP
- International Application: PCT/EP2012/055249 WO 20120323
- International Announcement: WO2013/139403 WO 20130926
- Main IPC: G01J5/08
- IPC: G01J5/08 ; H01L31/0216 ; G01J5/04 ; G01J5/02 ; G01J5/20 ; G02B1/115 ; H01L31/18

Abstract:
The invention refers to an electromagnetic radiation sensor micro device for detecting electromagnetic radiation, which device comprises a substrate and a cover at least in part consisting of an electromagnetic radiation transparent material, and comprising a reflection reducing coating and providing a hermetic sealed cavity and an electromagnetic radiation detecting unit arranged within the cavity. The reflection reducing coating is arranged in form of a multi-layer thin film stack, which comprises a first layer and a second layer arranged one upon the other. The first layer has a first refractive index and the second layer has a second refractive index different from the one of said first layer. First and second layer are of such layer thickness that for a certain wavelength there is destructive interference. The invention also refers to a wafer element as well as method for manufacturing such a device.
Public/Granted literature
- US20150048470A1 ELECTROMAGNETIC RADIATION MICRO DEVICE, WAFER ELEMENT AND METHOD FOR MANUFACTURING SUCH A MICRO DEVICE Public/Granted day:2015-02-19
Information query