Invention Grant
- Patent Title: Chemical film on substrate, method of forming the same, and method of forming N-hydroxysuccinimide ester-functionalized paracyclophane
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Application No.: US14265377Application Date: 2014-04-30
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Publication No.: US09771324B2Publication Date: 2017-09-26
- Inventor: Hsien-Yeh Chen , Chih-Hao Chang , Chiao-Tzu Su , Chun-Pin Lin , Jen Jang
- Applicant: Hsien-Yeh Chen
- Applicant Address: TW Taipei
- Assignee: Hsien-Yeh Chen
- Current Assignee: Hsien-Yeh Chen
- Current Assignee Address: TW Taipei
- Agent Winston Hsu
- Priority: TW103100440A 20140106
- Main IPC: C07D207/46
- IPC: C07D207/46 ; C09D179/08 ; C23C16/44 ; C23C16/30 ; B05D1/00 ; C08G61/02
Abstract:
The present invention provides a method of forming N-hydroxysuccinimide ester-functionalized paracyclophane. The present method is carried out by adding 4-carboxyl-paracyclophane into N,N′-Dicyclohexylcarbodiimide (DCC) and N-Hydroxysuccinimide (NHS) to form N-hydroxysuccinimide ester-functionalized paracyclophane. The present invention further provides a chemical film on a substrate and a method of forming the same, wherein the chemical film includes N-hydroxysuccinimide ester-functionalized poly-para-xylylene.
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