Invention Grant
- Patent Title: Material deposition device and method of use
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Application No.: US14561978Application Date: 2014-12-05
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Publication No.: US09775694B2Publication Date: 2017-10-03
- Inventor: Wojtek Tutak
- Applicant: ADA FOUNDATION
- Applicant Address: US IL Chicago
- Assignee: American Dental Association Foundation
- Current Assignee: American Dental Association Foundation
- Current Assignee Address: US IL Chicago
- Main IPC: A61C19/06
- IPC: A61C19/06 ; B05B7/06 ; B05B7/16 ; D01D4/02 ; D01D5/14 ; A61L27/18 ; A61L27/22

Abstract:
A material deposition device includes a solution supply component, a gas supply component, and a co-axial discharge mechanism. The co-axial discharge mechanism includes a solution discharge mechanism, and a gas discharge mechanism co-axial with the solution discharge mechanism. The material deposition device further includes an alignment component that aligns the solution discharge mechanism in a center of the gas discharge mechanism; and an orifice plate with a number of turbulence inducing structures that induce turbulence in gas exiting the gas discharge mechanism.
Public/Granted literature
- US20160157978A1 MATERIAL DEPOSITION DEVICE AND METHOD OF USE Public/Granted day:2016-06-09
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