Invention Grant
- Patent Title: Charged particle beam apparatus and processing method
-
Application No.: US14601446Application Date: 2015-01-21
-
Publication No.: US09793092B2Publication Date: 2017-10-17
- Inventor: Masashi Muramatsu , Tomokazu Kozakai , Fumio Aramaki
- Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
- Applicant Address: JP
- Assignee: HITACHI HIGH-TECH SCIENCE Corporation
- Current Assignee: HITACHI HIGH-TECH SCIENCE Corporation
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2014-009679 20140122
- Main IPC: H01J37/304
- IPC: H01J37/304 ; H01J37/22 ; H01J37/28 ; G21K5/02

Abstract:
A charged particle beam apparatus has a charged particle beam column configured to irradiate a charged particle beam, and a controller configured to control the charged particle beam column to irradiate the charged particle beam at a first pixel interval for a first region and to irradiate the charged particle beam at a second pixel interval different from the first pixel interval for a second region included in the first region. The first and second regions include plural first and second pixels each including first and second sub-pixels which are irradiated by the charged particle beam to generate secondary electrons. First and second sub-pixel images are formed based on the detected secondary electrons, and the first and second sub-pixel images are synthesized to form first and second images.
Public/Granted literature
- US20150206708A1 CHARGED PARTICLE BEAM APPARATUS AND PROCESSING METHOD Public/Granted day:2015-07-23
Information query