Invention Grant
- Patent Title: Ion source, quadrupole mass spectrometer and residual gas analyzing method
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Application No.: US15370365Application Date: 2016-12-06
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Publication No.: US09799504B2Publication Date: 2017-10-24
- Inventor: Masanobu Nakazono , Hirotaka Yabushita , Junya Nakai , Tomoko Katsuda
- Applicant: HORIBA STEC, CO., LTD.
- Applicant Address: JP Kyoto
- Assignee: HORIBA STEC, CO., LTD.
- Current Assignee: HORIBA STEC, CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2015-242481 20151211
- Main IPC: H01J49/16
- IPC: H01J49/16 ; H01J49/00 ; H01J49/42

Abstract:
In order to attain a main objective of the present invention to provide an ion source capable of efficiently extracting ions, the ion source is configured to include: a conductive tubular body having an ion emitting aperture in a tip surface thereof and a penetration portion in a side wall thereof allowing thermo-electrons to pass through from an outside toward an inside; a mesh surrounding an outer periphery of the penetration portion; and a thermionic emission filament surrounding an outer periphery of the mesh, such that the thermo-electrons emitted from the thermionic emission filament pass through the mesh and reach the inside of the conductive tubular body through the penetration portion.
Public/Granted literature
- US20170170000A1 ION SOURCE, QUADRUPOLE MASS SPECTROMETER AND RESIDUAL GAS ANALYZING METHOD Public/Granted day:2017-06-15
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