Invention Grant
- Patent Title: CD-SEM technique for wafers fabrication control
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Application No.: US14985847Application Date: 2015-12-31
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Publication No.: US09824852B2Publication Date: 2017-11-21
- Inventor: Roman Kris , Yakov Weinberg , Yan Ivanchenko , Ishai Schwarzband , Dan Lange , Arbel Englander , Efrat Noifeld , Ran Goldman , Ori Shoval
- Applicant: Applied Materials Israel Ltd.
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel Ltd
- Current Assignee: Applied Materials Israel Ltd
- Current Assignee Address: IL Rehovot
- Agency: Lowenstein Sandler LLP
- Main IPC: H01J37/22
- IPC: H01J37/22 ; H01J37/28 ; G01N23/225 ; G01B15/04
Abstract:
A Critical Dimensions Scanning Electron Microscope (CD-SEM) is described that comprises a unit for performing CD-SEM measurements of a semiconductor wafer, a BSE imaging unit for obtaining a Grey Level image (GL) of the wafer, and a unit for GL analysis and for processing the GL analysis results with reference to results of the CD-measurements.
Public/Granted literature
- US20170194125A1 CD-SEM TECHNIQUE FOR WAFERS FABRICATION CONTROL Public/Granted day:2017-07-06
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