Invention Grant
- Patent Title: Chatter avoidance method and device
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Application No.: US14971438Application Date: 2015-12-16
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Publication No.: US09833868B2Publication Date: 2017-12-05
- Inventor: Tsung-Ling Hwang , Chin-Te Lin , Shuo-Peng Liang , Ta-Jen Peng , Jen-Ji Wang , Tzuo-Liang Luo
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Rabin & Berdo, P.C.
- Priority: TW104133003A 20151007
- Main IPC: B23Q17/09
- IPC: B23Q17/09 ; G05B19/404

Abstract:
A chatter avoidance method and device is provided, including steps of: providing a stable operating condition plot; partially removing a first layer of a workpiece with a predetermined first removal depth according to a safe removal depth of the stable operating condition plot and sensing a chatter caused by the removal operation; if no chatter is sensed, completing the removal operation, otherwise, continuing to partially remove the first layer with a second removal depth less than the predetermined first removal depth; and determining a minimum removal depth according to the removal operation, and removing a last layer of the workpiece with a last removal depth less than or equal to the minimum removal depth, allowing the workpiece to have a target thickness. The disclosure prevents a chatter from continuously occurring without requiring a shut-down and thereby maintains a desired production rate.
Public/Granted literature
- US20170100810A1 CHATTER AVOIDANCE METHOD AND DEVICE Public/Granted day:2017-04-13
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