Invention Grant
- Patent Title: Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
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Application No.: US15021240Application Date: 2014-09-02
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Publication No.: US09835957B2Publication Date: 2017-12-05
- Inventor: Martijn Houben , Alwin De Kock , Hendrikus Johannes Marinus Van Abeelen , Marco Adrianus Peter Van Den Heuvel
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- International Application: PCT/EP2014/068575 WO 20140902
- International Announcement: WO2015/043890 WO 20150402
- Main IPC: B23B5/34
- IPC: B23B5/34 ; B23B31/28 ; G03B27/52 ; G03B27/58 ; G03F7/20 ; H01L21/687

Abstract:
A support table to support a surface of a substrate, wherein the support table includes: a base surface substantially parallel to the surface of the substrate, a plurality of burls protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions are arranged such that a plurality of the gaps are aligned to form a straight gas flow path towards an edge of the base surface.
Public/Granted literature
- US20160187791A1 SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2016-06-30
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