Invention Grant
- Patent Title: Hydrophobic nanostructured thin films
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Application No.: US15219925Application Date: 2016-07-26
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Publication No.: US09845409B2Publication Date: 2017-12-19
- Inventor: Walter J. Dressick , Melik C. Demirel
- Applicant: The United States of America, as represented by the Secretary of the Navy
- Applicant Address: US DC Washington
- Assignee: The United States of America, as represented by the Secretary of the Navy
- Current Assignee: The United States of America, as represented by the Secretary of the Navy
- Current Assignee Address: US DC Washington
- Agency: US Naval Research Laboratory
- Agent Joseph T. Grunkemeyer
- Main IPC: B32B27/00
- IPC: B32B27/00 ; C09D155/00 ; C09D165/04 ; B05D1/38 ; B05D1/00 ; C08G61/02 ; C09J7/00 ; C08F283/00 ; C08G81/00 ; B05D5/08 ; B05D5/10

Abstract:
Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
Public/Granted literature
- US20170029659A1 HYDROPHOBIC NANOSTRUCTURED THIN FILMS Public/Granted day:2017-02-02
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