Invention Grant
- Patent Title: Dummy patterns
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Application No.: US14993103Application Date: 2016-01-12
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Publication No.: US09857677B2Publication Date: 2018-01-02
- Inventor: Chen-Hua Tsai , Jian-Cheng Chen , Chin-Yueh Tsai , Yao-Jen Fan , Heng-Kun Chen , Hsiang Yang
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Main IPC: G03F1/70
- IPC: G03F1/70 ; G06F17/50 ; H01L21/033 ; H01L23/48 ; H01L23/528
Abstract:
A semiconductor layout pattern includes a device layout pattern, a plurality of rectangular first dummy patterns having a first size, a plurality of rectangular second dummy patterns having second sizes, and a plurality of bar-like third dummy patterns having varied third sizes. The pattern densities are smartly equalized by positioning the second dummy patterns.
Public/Granted literature
- US20160126182A1 DUMMY PATTERNS Public/Granted day:2016-05-05
Information query
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